Growth kinetic study of amorphous carbon thin film deposited by Ion Beam Sputtering deposition (IBSD) method using Avrami's model

Document Type : Research Article

Authors

1 Radiation applications research school, Nuclear sciences and technology research institute

2 Physics and Accelerators Research school, Nuclear Sciences and Technology Research Institute, Tehran, Iran

3 Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology (IROST), Tehran, Iran

4 Department of Advanced Materials and Renewable Energy, Iranian Research Organization for Science and Technology(IROST), Tehran, Iran

5 physics and Accelarators Research school, Nuclear sciences and technology research institute

amnc.2021.9.36.5

Abstract

The growth kinetic of amorphous carbon (a-C) thin films was investigated in the relation to the surface morphology and structural transformations. The a-C thin films were deposited by ion beam sputtering technique on the glass substrate. According to Avrami's model, the growth at the thickness above 56 nm (after 900 s deposition) is two-dimensional and the proposed equation for investigating about the growth process of amorphous carbon thin film in the present study is as follows: V=1-exp⁡(-2×〖10〗^(-7) t^2 ). Transformations of the thickness is similar to proposed Avrami's model follow a characteristic s-shaped, or sigmoidal, profile during deposition time from 300s to 4500s, where the transformation rates are low at the beginning and the end of the transformation but rapid in between. Surface roughness and structural transformation depend on the film thickness. Raman spectra showed the maximum displacement in G peak position created in the film thickness equal 360 nm with the reduction of the growth rate. The ID/IG ratio, the size of graphite crystallites with sp2 bonds (La) and the roughness of this layer is equal to 1.2, 1.48 nm and 20.39±4.8 nm, respectively.

Keywords

References

 [1] S. Logothetidis, P. Patsalas, M. Gioti, A. Galdikas,
L. Pranevicius, “Growth kinetics of sputtered amorphous carbon thin films: composition studies and
phenomenological model”, Thin Solid Films, Vol.
376, pp. 56-66, 2000.
[2] F. Bi, K. Hou, P. Yi, L. Peng, X. Lai, “Mechanisms
of growth, properties and degradation of amorphous
carbon films by closed field unbalanced magnetron
sputtering on stainless steel bipolar plates for PEMFCs”, Applied Surface Science Vol. 422, pp. 921-931,
2017.
[3] E. Pang, N. Vo, T. Philippe, P. Voorhees, “Modeling interface-controlled phase transformation kinetics
in thin films”, Journal of Applied Physics, Vol. 117,
pp. 175304, 2015.
[4] C. Casiraghi, A. Ferrari, J. Robertson, “The
smoothness of tetrahedral amorphous carbon”, Diamond and related materials, Vol. 14, pp. 913-920,
2005.
[5] M.A. Caro, V.L. Deringer, J. Koskinen, T. Laurila,
G. Csányi, “Growth Mechanism and Origin of High
sp3 Content in Tetrahedral Amorphous Carbon”,
Physical review letters, Vol. 120, pp. 166101, 2018.
[6] M. Avrami, “Kinetics of phase change. II transformation‐time relations for random distribution of
nuclei”, The Journal of chemical physics, Vol. 8, pp.
212-224, 1940.
[7] M. Avrami, “Kinetics of phase change. I General theory”, The Journal of chemical physics, Vol. 7,
pp.1103-1112, 1939.
[8] M. Kuśnierz, J. Łomotowski, “Using Avrami
equation in the studies on changes in granulometric
composition of algal suspension”, Hydrobiologia,
Vol. 758, pp. 243-255, 2015.
[9] M. Fanfoni, L. Persichetti, M. Tomellini, “Order
and randomness in Kolmogorov–Johnson–Mehl–
Avrami-type phase transitions”, Journal of Physics:
Condensed Matter, Vol. 24, 355002, 2012.
[10] A. Faleiros, T. Rabelo, G. Thim, M. Oliveira,
“Kinetics of phase change”, Materials Research, Vol.
3, pp. 51-60, 2000.
[11] M. Weinberg, R. Kapral, “Phase transformation
kinetics in finite inhomogeneously nucleated systems”, The Journal of chemical physics, Vol. 91, pp.
7146-7152, 1989.
[12] L. Levine, K.L. Narayan, K. Kelton, “Finite
size corrections for the Johnson–Mehl–Avrami–Kolmogorov equation”, Journal of materials research,
Vol. 12 . pp. 124-132, 1997.
[13] L. Constant, F. Le Normand, “HF CVD diamond
nucleation and growth on polycrystalline copper: A
kinetic study”, Thin Solid Films, Vol. 516, pp. 691-
695, 2008.
[14] W.R. Lambrecht, C.H. Lee, B. Segall, J.C. Angus, Z. Li, M. Sunkara, “Diamond nucleation by
hydrogenation of the edges of graphitic precursors”,
Nature, Vol. 364, pp. 607-610, 1993.
[15] M. Tomellini, R. Polini, V. Sessa, “A model kinetics for nucleation at a solid surface with application to diamond deposition from the gas phase”, Journal of applied physics, Vol. 70, pp. 7573-7578, 1991.
[16] H. Dai, X. Cheng, C. Wang, Y. Xue, Z. Chen,
“Structural, optical and electrical properties of amorphous carbon films deposited by pulsed unbalanced
magnetron sputtering”, Optik, Vol. 126, pp. 861-864,
2015.
[17] S. Logothetidis, “Surface and interface properties of amorphous carbon layers on rigid and flexible
substrates”, Thin Solid Films, Vol. 482, pp. 9-18,
2005.
[18] J.-K. Shin, C.S. Lee, K.-R. Lee, K.Y. Eun, “Effect of residual stress on the Raman-spectrum analysis of tetrahedral amorphous carbon films”, Applied
Physics Letters, Vol. 78, pp. 631-633, 2001.
[19] P.C. Kelires, “Intrinsic stress and stiffness variations in amorphous carbon”, Diamond and Related
Materials, Vol. 10, pp. 139-144, 2001.
[20] D. McKenzie, D. Muller, B. Pailthorpe, “Compressive-stress-induced formation of thin-film tetrahedral amorphous carbon”, Physical review letters,
Vol. 67, pp. 773, 1991.
[21] J. Robertson, “Deposition mechanisms for promoting sp3 bonding in diamond-like carbon”, Diamond and related materials, Vol. 2, pp. 984-989, 1993.
[22] J.W. Christian, C. JW, The theory of transformations in metals and alloys. I. Equilibrium and general
kinetic theory, 1975.
[23] M. Yari, M. Larijani, A. Afshar, M. Eshghabadi,  A. Shokouhy, “Physical properties of sputtered amorphous carbon coating”, Journal of alloys and compounds, Vol. 513, pp. 135-138, 2012.
[24] L. Eckertova, Physics of Thin Films, chapter 1,
Plenum Press, 1990.
[25] M. Zhong, C. Zhang, J. Luo, “Effect of substrate
morphology on the roughness evolution of ultra thin
DLC films”, Applied Surface Science, Vol. 254, pp.
6742-6748, 2008.
[26] L. Bai, G. Zhang, Z. Wu, J. Wang, P. Yan, “Effect
of different ion beam energy on properties of amorphous carbon film fabricated by ion beam sputtering
deposition (IBSD)”, Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions
with Materials and Atoms, Vol. 269, pp. 1871-1877,
2011.
[27] M. Salvadori, D. Martins, M. Cattani, “DLC
coating roughness as a function of film thickness”,
Surface and Coatings Technology, Vol. 200, pp. 5119-
5122, 2006.
[28] Q. Jun, L. Jianbin, W. Shizhu, W. Jing, L. Wenzhi, “Mechanical and tribological properties of nonhydrogenated DLC films synthesized by IBAD”, Surface and Coatings Technology, Vol. 128, pp. 324-328,
2000.
[29] E. Mohagheghpour, M. Rajabi, R. Gholamipour,
M.M. Larijani, S. Sheibani, “Correlation study of
structural, optical and electrical properties of amorphous carbon thin films prepared by ion beam sputtering deposition technique”, Applied Surface Science,
Vol. 360, pp. 52-58, 2016. 

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